表 3.8 各种碳氟比条件对介质层和硅的影响蚀刻率、选择性蚀刻率/(NM/MIN>SELECTIVITYUNIFORMITY/%)SI3N4SIO2SISI3N4/SIO2SI3N4/SISI3N4SIO2SICH3F261226131.51.10.42CH2F2281681.13.50.430.3
